Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films
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چکیده
منابع مشابه
Heterocyclic dithiocarbamato-iron(III) complexes: single-source precursors for aerosol-assisted chemical vapour deposition (AACVD) of iron sulfide thin films.
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ژورنال
عنوان ژورنال: Dalton Transactions
سال: 2018
ISSN: 1477-9226,1477-9234
DOI: 10.1039/c7dt04694d